AST聚昌科技有限公司
加入時間:2008-04-22資本額:10000萬
瀏覽次數:699by:聚昌科技
PECVD System
Description: AST Aegis PECVD System provides the complete product line covering the production scal
Description:
AST Aegis PECVD System provides the complete product line covering the production scale from volume production, pilot production to RD platform for Dielectric and Si-based film deposition.
Aegis PECVD System has served Industry Applications of worldwide customers from LED, LD, Solar Cell, Power Semiconductor, Compound Semiconductor, MEMS, Advanced Packaging, EMI Device, and AR Coatings.
1) Hard Mask (SiO2)
2) Passivation (SiO2, Si3N4)
3) SiC
4) Dimond-like Coating (DLC)
5) PIN of Thin Film PV
6) Micro-Crystalline Silicon
7) Anti-Reflection (AR) Coating
Features:
Aegis series has system configuration of Plasma Enhanced and HDP High Density Plasma Source for CVD, suitable for wide temperature range and low film stress deposition requirement of different customer application.
Specification:
Standard Chamber Batch System and Multi-Chamber Cluster Platform Available.
Please contact AST for your application.
Safety Approval:
TUV
Country of Origin:
Taiwan
Main Export Markets:
Worldwide
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